This full-time role involved mechanical design across two semiconductor metrology product lines. Both products under the FaST optical metrology group at KLA.

Details

On the x-ray metrology tool, work included designing mounts and fixturing for cables and hardware, developing the motion system for a calibration grating, and supporting broader mechanical engineering efforts on a rotating anode x-ray tool. On the thin films ellipsometer, the focus was mechanical design for X-ray and deep UV (DUV) environments. Ansys static-structural and modal analysis were used to maintain stiffness and modal response while increasing the mass of a mirror mount by 100%. A new beam line fixture was also designed for in-house testing of optical mounts.